P04100 - SEMI P41 - Specification for Mask Defect Data Handling with XML, Between Defect Inspection Tools, Repair Tools, and Review Tools ElnTpc-Semiconductor Manufacturing SEMI T11-0703 (technical revision)

SEMI T11-0703 (technical revision)

orgで入手可能になり，2003年7月発行に至る。初版は1995年発行。

SEMI E134-0313 (technical revision)

Referenced SEMI StandardsSEMI MF26 — Test Method for Determining the Orientation of a Semiconductive Single Crystal

3  This Guide provides a specification framework for reporting measurements of silicon wafer surface features through the use of scanning (or automated) surface inspection systems (SSIS)

P04100 - SEMI P41 - Specification for Mask Defect Data Handling with XML, Between Defect Inspection Tools, Repair Tools, and Review Tools ElnTpc-Semiconductor Manufacturing SEMI T11-0703 (technical revision)This specification was technically approved by the Global Micropatterning Committee and is the direct responsibility of the Japanese Micropatterning Committee. Current edition approved by the Japanese Regional Standards Committee on January 9, 2004. Initially available at www. semi. org February 2004; to be published March 2004. E This standard was modified in September 2004 to correct editorial errors. Changes were made to Tables 2 and 3. NOTICE: